The mass-action law: in a semiconductor at thermal equilibrium, the product of the free-electron concentration and the hole concentration is a constant fixed only by temperature, no matter how the material is doped.

Here is the electron concentration (per cm³), the hole concentration, and the Intrinsic carrier concentration, the value and each take in pure (intrinsic) material, where so trivially. Even after doping changes and individually by orders of magnitude, their product still equals .

Why it holds

It comes straight from the balance of generation and recombination. Thermal generation breaks bonds at a rate set by temperature alone; it doesn’t care whether the silicon is doped. Recombination destroys an electron and a hole together, at a rate proportional to how many of each are available, i.e. proportional to . At equilibrium the two rates are equal:

So is forced to a fixed value at a given temperature. Evaluating it for the intrinsic case (where ) pins that value at . Doping shifts and in opposite directions but can’t change the product, because the generation rate it must balance hasn’t changed.

Consequence

Since is pinned, raising one carrier population forces the other down by the same factor. If Doping increases the electron concentration by a factor of a million, then to keep the hole concentration drops by a factor of a million:

This is how doping works, and why doped silicon has one carrier type that overwhelmingly dominates (Majority and minority carriers). In n-type silicon with donor concentration , essentially every donor contributes a free electron so , and the law gives the minority-hole concentration:

For example, silicon doped with has but only holes, a billion-to-one imbalance. Symmetrically for p-type material: , . This one relation lets you write down the minority-carrier concentration in any doped sample, which sets the Reverse saturation current of a junction.